Pat Gelsinger's bet: Wavelength below 13.5nm (EUV) used in lithography before April 2036?
2
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42%
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This resolves positively if credible media reports that a process node that uses light below 13.5 nm entered mass production before April 2036.
This is a bet that Pat Gelsinger, Intel's ex-CEO, made with Ian Cutress: https://youtu.be/SauujHpNpXY?t=2300
Pat is working with xLight on free-electron lasers for photolithography.
This question is managed and resolved by Manifold.
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